GDM300晶圆研磨机又称晶圆抛光/晶圆背抛/晶圆减薄机
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GDM300晶圆研磨机又称晶圆抛光/晶圆背抛/晶圆减薄机GDM300晶圆研磨机/WaferGrinding概要:GDM300WaferGrindingisafullyautomaticcontinuousdownfeedgrindingmachinewithdualpolishingstati***forincreasedthroughput.Wafersarehandledthroughthemachinebya6-axisrobot,andload/unloadarmsdesignedfor25umcapability.Anoptionaledgetrimmingsystemisrecommendedforeliminatingedgechippingforthinwafers.Chuckspeed,grindingwheel,andgrindspindledownfeedratespeedscanbeusedtomanipulategrinderthroughput,surfacefinish,andwheellife.Atwo-pointin-processgaugemeasuringsystemcontrolswaferthicknessundergrindspindles1and2withanoptionallaserdetectionforamoreprecisionthicknessaccuracy(recommendedfor<50um).Programmableoscillatingpolishheadscanbeprogrammedtomaintainwaferprofile(ttv)inconjunctionwithwiththeoptionalmotorizedspindleangleadjustment.Aftercompletionatgrindandpolish,waferisautomaticallytransferredbyrobottothemounterunitforUVexposure,detape,andmount.Pre-cutDAFfeatureisoptionalwhilesingleDAFisincluded.Coin-stackfeaturemaybeintegrated.Thelocalpolishingunitremovessubsurfacedamageforincreasedwaferdiestrengthandtheabilitytohandlefinalthicknessof25micr***.GDM300晶圆研磨机(WaferGrinding)特长:·Theprocessfrombackgrindingtowafermountingcontinuouslybyfullyautomaticsystem,Whichenabletogrindtill25umthickness.·With2headpolishingstage,throughputisalmostdoublecomparedwith1polishheadsystem.·Builtinedgetrimmingsystemis***ailableasanoptionforthinwaferprocess.·Dualindexsystem,whichpolishingstageandgrindingstageiscompletelyseparated,satisfythecleannessrequiredforTSVandMEMSprocess.·LessthanRa1Aultraluminance,ultramirrorsurfaceispossible.GDM300晶圆研磨机(WaferGrinding)相关产品:衡鹏供应GNX200BP晶圆研磨/晶圆减薄/晶圆抛光/晶圆背抛/WaferGrinding)
上海衡鹏企业发展有限公司
业务 QQ: 253167820