氧化铪靶材
ProductnameDesign..Size(mm)QuantityCustomerContractNo.HfO2targetHfO2Density(g/cm3)SurfacequalityCleanandnoburr,scratchorcrackvisibleChemicalcompositionPurity(wt%)Impuritycontent(%)ZrAlCaCdPbFeCuCoCrMgMnMoHfO2+ZrO2>99.950.33<0.001<0.002<0.001<0.0020.003<0.001<0.001<0.001<0.002<0.002<0.002NaNiPSnTiVCl-<0.002<0.003<0.002<0.002<0.007<0.0011.32Check(Signature)QualityManager(Signature)ProductnameDesign..Size(mm)QuantityCustomerContractNo.HfO2targetHfO2Density(g/cm3)SurfacequalityCleanandnoburr,scratchorcrackvisibleChemicalcompositionPurity(wt%)Impuritycontent(%)ZrAlCaCdPbFeCuCoCrMgMnMoHfO2+ZrO2>99.950.33<0.001<0.002<0.001<0.0020.003<0.001<0.001<0.001<0.002<0.002<0.002NaNiPSnTiVCl-<0.002<0.003<0.002<0.002<0.007<0.0011.32Check(Signature)QualityManager(Signature))