性能优势·Coatingdepositioncarriedoutusingahighdensityoflowenergybombardingi***.使用高密度低能量轰击离子进行沉积镀膜。·Depositionofverydense,non-columnarcoatingstructureswithlowinternalstresses.镀层致密度好，低柱状晶结构，内应力低·Depositionofcoatingswithdensestructuresatlowtemperatures.•可在低温环境下沉积致密结构的镀层·Highefficiencyofioncleaningresultingincoatingswiththehighestlevelsofadhesion.***率等离子清理以提供高的镀层结合强度。·CoatingsqualityisassuredbytheuseofspeciallydesignedPla***agsputtersources,whichcreateanintensepla***aandhighionbombardmentofworkpieces.镀层品质保证是由使用专门设计pla***ag溅射源及提供高密度的等离子。)